
Wet-process vessels
Quartz Wet Process Tanks
Custom tanks and vessels reviewed around chemistry, circulation, capacity, thermal load and leak criteria.
View product detailsSemiconductor applications
Cleaning · Wet etch · Resist strip
Quartz vessels and support structures assessed against the actual liquid chemistry and wet-bench arrangement.
Process overview
Wet processing uses liquid chemistry for operations such as cleaning, selective material removal and photoresist stripping. Cleaning can recur between manufacturing steps to remove unwanted material and prepare the wafer surface for subsequent processing.
Quartz tanks, overflow vessels and supporting structures are candidates only where the chemistry and operating conditions are compatible. WONIK reviews tank capacity, circulation, connections, structural support and leak requirements from the customer specification.
The liquid composition, concentration and working temperature are essential inputs to material selection; a process name alone is insufficient.
The drawing establishes the working volume, overflow arrangement, inlet and outlet connections, and support interfaces.
Dimensional inspection, cleanliness and leak requirements are defined for the proposed vessel and its intended installation.
Conceptual application guide—not an equipment operating procedure or a manufacturing recipe.
Before quotation
Hydrofluoric acid (HF) attacks fused quartz. Quartz tanks must not be assumed suitable for HF-containing processes. Other chemistries also require review of concentration, temperature and exposure; alkaline contamination can create problems during later heating. Final material selection and qualification remain application-specific.
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