Semiconductor applications

Wet processing

Cleaning · Wet etch · Resist strip

Quartz vessels and support structures assessed against the actual liquid chemistry and wet-bench arrangement.

Process overview

Where the components fit

Wet processing uses liquid chemistry for operations such as cleaning, selective material removal and photoresist stripping. Cleaning can recur between manufacturing steps to remove unwanted material and prepare the wafer surface for subsequent processing.

Quartz tanks, overflow vessels and supporting structures are candidates only where the chemistry and operating conditions are compatible. WONIK reviews tank capacity, circulation, connections, structural support and leak requirements from the customer specification.

  1. 01

    Identify the chemistry

    The liquid composition, concentration and working temperature are essential inputs to material selection; a process name alone is insufficient.

  2. 02

    Define containment and circulation

    The drawing establishes the working volume, overflow arrangement, inlet and outlet connections, and support interfaces.

  3. 03

    Agree the acceptance criteria

    Dimensional inspection, cleanliness and leak requirements are defined for the proposed vessel and its intended installation.

Conceptual application guide—not an equipment operating procedure or a manufacturing recipe.

Before quotation

Define your application.

Hydrofluoric acid (HF) attacks fused quartz. Quartz tanks must not be assumed suitable for HF-containing processes. Other chemistries also require review of concentration, temperature and exposure; alkaline contamination can create problems during later heating. Final material selection and qualification remain application-specific.

Request a technical review
  • Complete chemistry, concentration and expected exposure
  • Working temperature, capacity and thermal load
  • Overflow, circulation, inlet and outlet arrangement
  • Support, mounting and mating-interface drawing
  • Leak, cleanliness and customer qualification requirements