Semiconductor applications

Thermal processing

Oxidation · Diffusion · Annealing

Carriers, process tubes and thermal-support components for drawing-led furnace applications.

Process overview

Where the components fit

Thermal processing uses controlled heating to change a material or support a reaction. Oxidation, diffusion and annealing serve different purposes, and the temperature profile, atmosphere and time exposure depend on the device and process stage.

In suitable batch-furnace applications, wafer boats hold substrates while process tubes define the surrounding process space. WONIK reviews quartz and silicon carriers, tubes and thermal-support assemblies against the customer drawing, loading arrangement and acceptance criteria.

  1. 01

    Support the substrates

    Carrier orientation, slot geometry and loading interfaces define how wafers are positioned within the intended equipment.

  2. 02

    Control the thermal environment

    The furnace combines a defined atmosphere with a controlled heating cycle. Tube geometry and support position must be reviewed for that application.

  3. 03

    Check the component requirements

    Material, dimensional, cleanliness and inspection requirements are agreed before a component enters the customer qualification process.

Conceptual application guide—not an equipment operating procedure or a manufacturing recipe.

Before quotation

Define your application.

Silicon (Si) and silicon carbide (SiC) are different materials. The silicon wafer boats shown here are Si products. No carrier, tube or thermal-support assembly is qualified for a tool or thermal cycle by its product name alone.

Request a technical review
  • Wafer or substrate size, batch capacity and loading orientation
  • Furnace arrangement, component position and mating interfaces
  • Temperature profile, process atmosphere and pressure
  • Confirmed material grade, surface and cleanliness requirements
  • Drawing revision, inspection criteria and qualification route